A two magnetron sputter deposition chamber equipped with an additional ion gun for in situ observation of thin film growth and surface modification by synchrotron radiation scattering
No abstract available.
URL: https://publications.hereon.de/id/26000/
Authors:Schell, N., Borany, J.v., Hauser, J.
Year:2007
In: AIP Conference Proceedings, Synchrotron Radiation Instrumentation: 9th International Conference on Synchrotron Radiation Instrumentation, SRI 2006
Volume:879
Location:Daegu (ROK)
Date:28.05.-02.07.2006
Pages:1813 - 1816
ISBN: 978-0-7354-0373-4
Cite as: Schell, N.; Borany, J.v.; Hauser, J.: A two magnetron sputter deposition chamber equipped with an additional ion gun for in situ observation of thin film growth and surface modification by synchrotron radiation scattering. In: Choi, J.-Y.; Rah, S. (Eds.): AIP Conference Proceedings, Synchrotron Radiation Instrumentation: 9th International Conference on Synchrotron Radiation Instrumentation, SRI 2006. Vol. 879 Daegu (ROK), 28.05.-02.07.2006, 2007. 1813 - 1816. (ISBN: 978-0-7354-0373-4 )
