In: Optics for Forth-Generation X-ray Sources, SPIE´S - 46th Annual Meeting, International Symposium on Optical Science and Technology
Location:San Diego, CA (USA)
Date:29.07.-03.08.2001
Cite as: Jacobi, S.; Wiesmann, J.; Steeg, B.; Feldhaus, J.; Michaelsen, C.; : Development of thin-film total-reflection mirrors for the XUV-FEL. In: Optics for Forth-Generation X-ray Sources, SPIE´S - 46th Annual Meeting, International Symposium on Optical Science and Technology. San Diego, CA (USA), 29.07.-03.08.2001, 2001.