A wavelength-dispersive arrangement for wafer analysis with total reflection X-ray fluorescence spectrometry
using synchrotron radiation
No abstract available.
URL: https://publications.hereon.de/id/23105/
Authors:Schwenke, H., Beaven, P., Knoth, J., Jantzen, E.
Year:2002
In: 9th Symposium on Total Reflection X-ray Fluorescence Analysis and Related Methods
Location:Funchal, Madeira (P)
Date:08.-13.09.2002
Cite as: Schwenke, H.; Beaven, P.; Knoth, J.; Jantzen, E.: A wavelength-dispersive arrangement for wafer analysis with total reflection X-ray fluorescence spectrometry
using synchrotron radiation. In: 9th Symposium on Total Reflection X-ray Fluorescence Analysis and Related Methods. Funchal, Madeira (P), 08.-13.09.2002, 2002.
