Authors:Stoermer, M.,Liard-Cloup, A.,Felten, F.,Jacobi, S.,Steeg, B.,Feldhaus, J.,Bormann, R.
Year:2004
In: Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, SPIE 49th Annual Meeting
Volume:5533
Location:Denver, CO (USA)
Date:02.-06.08.2004
Pages:58-65
Type:conference paper
Cite as: Stoermer, M.; Liard-Cloup, A.; Felten, F.; Jacobi, S.; Steeg, B.; Feldhaus, J.; Bormann, R.: Investigations of large x-ray optics for free electron lasers. In: Khounsary, A.; Dinger, U.; Ota, K. (Ed.): Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, SPIE 49th Annual Meeting. Denver, CO (USA). 2004. 58-65. DOI: 10.1117/12.559619