Burger
Journalpaper

Potential of Total Reflection and Grazing Incidence XRF for Contamination and Process Control in Semiconductor Fabrication

No abstract available.
  • URL: https://publications.hereon.de/id/19184/
  • Authors:Weiss, C., Knoth, J., Schwenke, H., Geisler, H., Lerche, J., Schulz, R., Ullrich, H.-J.
  • Year:2000
  • In: Mikrochimica Acta
  • Volume:133
  • Issue:1-4
  • Pages:65 - 68
  • Type:Journalpaper
  • ISSN: 0026-3672
  • Cite as: Weiss, C.; Knoth, J.; Schwenke, H.; Geisler, H.; Lerche, J.; Schulz, R.; Ullrich, H.-J.: Potential of Total Reflection and Grazing Incidence XRF for Contamination and Process Control in Semiconductor Fabrication. In: Mikrochimica Acta. Vol. 133 (2000) 1-4, 65 - 68.
QR Code: Link to publication