Potential of Total Reflection and Grazing Incidence XRF for Contamination and Process Control in Semiconductor Fabrication

journal article

No abstract available.

URL: https://publications.hereon.de/id/19184/
Authors:Weiss, C.,Knoth, J.,Schwenke, H.,Geisler, H.,Lerche, J.,Schulz, R.,Ullrich, H.-J.
Year:2000
In: Mikrochimica Acta
Volume:133
Issue:1-4
Pages:65-68
Type:journal article
ISSN: 0026-3672
Cite as: Weiss, C.; Knoth, J.; Schwenke, H.; Geisler, H.; Lerche, J.; Schulz, R.; Ullrich, H.: Potential of Total Reflection and Grazing Incidence XRF for Contamination and Process Control in Semiconductor Fabrication. Mikrochimica Acta. 2000. vol. 133, no. 1-4, 65-68.