Phase selection by competitive growth in Ti/Al thin film diffusion couples

Confpaper

No abstract available.

URL: https://publications.hereon.de/id/17262/
Authors:Woehlert, S., Michaelsen, C., Bormann, R.
Year:1997
In: Thin Films: Structure and Morphology
Location:Boston, MA (USA)
Date:02.-06.12.1996
Pages: 15 - 20
Type:Confpaper
Cite as: Woehlert, S.; Michaelsen, C.; Bormann, R.: Phase selection by competitive growth in Ti/Al thin film diffusion couples. In: Cammarata, R.C.; Chason, E.H.; Einstein, T.L.; Williams, E.D. (Eds.): Thin Films: Structure and Morphology. Boston, MA (USA), 02.-06.12.1996, 1997. 15 - 20.