Characterization of near surface layers by means of total reflection X-ray fluorescence spectrometry
No abstract available.
URL: https://publications.hereon.de/id/17052/
Authors:Schwenke, H., Gutschke, R., Knoth, J.
Year:1992
In: Advances in X-Ray Analysis: Proceedings of combined First Pacific-International Congress on X-Ray Analytical Methods (PICXAM) and Fortieth Annual Conference on Applications of X-Ray Analysis
Location:Hilo and Honolulu, HI (USA)
Date:August 7-16, 1991
Issue:35
Pages: 941 - 946
Type:Confpaper
ISBN: 0306442493
Cite as: Schwenke, H.; Gutschke, R.; Knoth, J.: Characterization of near surface layers by means of total reflection X-ray fluorescence spectrometry. In: Barrett, C.S.; Gilfrich, J.V.; Huang, T.C.; Jenkins, R.; McCarthy, G.J.; Predecki, P.K.; Ryon, R.; Smith, D.K. (Eds.): Advances in X-Ray Analysis: Proceedings of combined First Pacific-International Congress on X-Ray Analytical Methods (PICXAM) and Fortieth Annual Conference on Applications of X-Ray Analysis. Hilo and Honolulu, HI (USA), August 7-16, 1991, 1992. 35, 941 - 946. (ISBN: 0306442493)
