Determination of concentration depth profiles using total-reflection X-ray fluorescence spectrometry in combination with ion-beam etching

journal article

No abstract available.

URL: https://publications.hereon.de/id/12290/
Authors:Guenther, R.,Wiener, G.,Knoth, J.,Schwenke, H.,Bormann, R.
Year:1996
In: Review of Scientific Instruments
Volume:67
Issue:6
Pages:2332-2336
Type:journal article
ISSN: 0034-6748
Cite as: Guenther, R.; Wiener, G.; Knoth, J.; Schwenke, H.; Bormann, R.: Determination of concentration depth profiles using total-reflection X-ray fluorescence spectrometry in combination with ion-beam etching. Review of Scientific Instruments. 1996. vol. 67, no. 6, 2332-2336.