Critical oxygen partial pressure for the In-Situ' preparation of high Tc-thin films'
No abstract available.
URL: https://publications.hereon.de/id/11991/
Authors:Bormann, R., Noelting, J.
Year:1989
In: Physica C
Volume:162164
Pages: 81
Type:Journalpaper
ISSN: 0921-4534
Cite as: Bormann, R.; Noelting, J.: Critical oxygen partial pressure for the In-Situ' preparation of high Tc-thin films'. In: Physica C. Vol. 162164 (1989) 81.