Critical oxygen partial pressure for the In-Situ' preparation of high Tc-thin films'
No abstract available.
URL: https://publications.hereon.de/id/11991/
Authors:Bormann, R.,Noelting, J.
Year:1989
In: Physica C
Volume:162164
Pages:81
Type:journal article
ISSN: 0921-4534
Cite as: Bormann, R.; Noelting, J.: Critical oxygen partial pressure for the In-Situ' preparation of high Tc-thin films'. Physica C. 1989. vol. 162164, 81.
