Surface analysis for Si-Wafers using total reflection X-ray fluorescence analysis

journal article

No abstract available.

URL: https://publications.hereon.de/id/11945/
Authors:Berneike, W.,Knoth, J.,Schwenke, H.,Weisbrod, U.
Year:1989
In: Fresenius Journal of Analytical Chemistry
Volume:333
Pages:524-526
Type:journal article
ISSN: 0937-0633
Cite as: Berneike, W.; Knoth, J.; Schwenke, H.; Weisbrod, U.: Surface analysis for Si-Wafers using total reflection X-ray fluorescence analysis. Fresenius Journal of Analytical Chemistry. 1989. vol. 333, 524-526.