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Journalpaper

Surface analysis for Si-Wafers using total reflection X-ray fluorescence analysis

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  • URL: https://publications.hereon.de/id/11945/
  • Authors:Berneike, W., Knoth, J., Schwenke, H., Weisbrod, U.
  • Year:1989
  • In: Fresenius Journal of Analytical Chemistry
  • Volume:333
  • Pages: 524-526
  • Type:Journalpaper
  • ISSN: 0937-0633
  • Cite as: Berneike, W.; Knoth, J.; Schwenke, H.; Weisbrod, U.: Surface analysis for Si-Wafers using total reflection X-ray fluorescence analysis. In: Fresenius Journal of Analytical Chemistry. Vol. 333 (1989) 524-526.
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