@misc{lu_orienting_siliconcontaining_2017, 
author={Lu, K.-Y., Lo, T.-Y., Georgopanos, P., Avgeropoulos, A., Shi, A.-C., Ho, R.-M.},
title={Orienting Silicon-Containing Block Copolymer Films with Perpendicular Cylinders via Entropy and Surface Plasma Treatment},
year={2017},
howpublished = {journal article},
doi = {https://doi.org/10.1021/acs.macromol.7b02218},
abstract = {Controlling the orientation of nanostructured block copolymer (BCP) thin films is essential for next-generation lithography. However, obtaining BCP with perpendicular orientation remains a challenge because of the surface selectivity to the different blocks. This challenge is especially severe for silicon-containing BCPs which is notorious for its high surface energy difference between constituted blocks. Here, we demonstrate a new approach to achieve perpendicular orientation with high aspect ratio using a combination of architecture effect (entropy effect) and surface air plasma treatment (enthalpy effect). Specifically, perpendicular cylinders of star-block copolymers composed of polystyrene and poly(dimethylsiloxane) blocks can be formed from the bottom substrate to the top surface of the thin film.},
note = {Online available at: \url{https://doi.org/10.1021/acs.macromol.7b02218} (DOI). Lu, K.; Lo, T.; Georgopanos, P.; Avgeropoulos, A.; Shi, A.; Ho, R.: Orienting Silicon-Containing Block Copolymer Films with Perpendicular Cylinders via Entropy and Surface Plasma Treatment. Macromolecules. 2017. vol. 50, no. 23, 9403-9410. DOI: 10.1021/acs.macromol.7b02218}}