%0 journal article %@ 0040-6090 %A Martins, R.M.S., Schell, N., Reuther, H., Pereira, L., Mahesh, K.K., Silva, R.J.C., Braz Fernandes, F.M. %D 2010 %J Thin Solid Films %N 1 %P 122-128 %R doi:10.1016/j.tsf.2010.07.078 %T Texture development, microstructure and phase transformation characteristics of sputtered Ni–Ti Shape Memory Alloy films grown on TiN<111> %U https://doi.org/10.1016/j.tsf.2010.07.078 1 %X The in-situ study of the structural evolution of the growing Ni–Ti film as a consequence of changing the Ti:Ni ratio during deposition (on a TiN<111> layer) has also been performed. The preferential growth of < 110> oriented grains of the Ni–Ti B2 phase has been as well observed despite the precipitation of Ti2Ni during the deposition of a Ti-rich Ni–Ti film fraction. Functionally graded Ni–Ti films should lead to an intrinsic “two-way” shape memory effect which is a plus for the miniaturization of Ni–Ti films based devices in the field of micro-electro-mechanical systems.