@misc{martins_texture_development_2010, author={Martins, R.M.S., Schell, N., Reuther, H., Pereira, L., Mahesh, K.K., Silva, R.J.C., Braz Fernandes, F.M.}, title={Texture development, microstructure and phase transformation characteristics of sputtered Ni–Ti Shape Memory Alloy films grown on TiN<111>}, year={2010}, howpublished = {journal article}, doi = {https://doi.org/10.1016/j.tsf.2010.07.078}, abstract = {The in-situ study of the structural evolution of the growing Ni–Ti film as a consequence of changing the Ti:Ni ratio during deposition (on a TiN<111> layer) has also been performed. The preferential growth of < 110> oriented grains of the Ni–Ti B2 phase has been as well observed despite the precipitation of Ti2Ni during the deposition of a Ti-rich Ni–Ti film fraction. Functionally graded Ni–Ti films should lead to an intrinsic “two-way” shape memory effect which is a plus for the miniaturization of Ni–Ti films based devices in the field of micro-electro-mechanical systems.}, note = {Online available at: \url{https://doi.org/10.1016/j.tsf.2010.07.078} (DOI). Martins, R.; Schell, N.; Reuther, H.; Pereira, L.; Mahesh, K.; Silva, R.; Braz Fernandes, F.: Texture development, microstructure and phase transformation characteristics of sputtered Ni–Ti Shape Memory Alloy films grown on TiN<111>. Thin Solid Films. 2010. vol. 519, no. 1, 122-128. DOI: 10.1016/j.tsf.2010.07.078}}