%0 Artikel
%@ 
%A Eichinger, P.
%A  Rath, H. J.
%A  Schwenke, H.

%D 1989
%J ASTM Special Technical Publicaton

%P  305-313 

%T Application of total reflection X-ray fluorescence analysis for metallic trace impurities on silicon wafer surfaces
%U 
 
%X