%0 journal article
%@ 0937-0633
%A Berneike, W., Knoth, J., Schwenke, H., Weisbrod, U.

%D 1989
%J Fresenius Journal of Analytical Chemistry

%P 524-526 

%T Surface analysis for Si-Wafers using total reflection X-ray fluorescence analysis
%U 
 
%X