%0 conference paper
%@ 
%A Stoermer, M.,Liard-Cloup, A.,Felten, F.,Jacobi, S.,Steeg, B.,Feldhaus, J.,Bormann, R.

%D 2004
%J Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, SPIE 49th Annual Meeting
%N 
%P 58-65 
%R doi:10.1117/12.559619
%T Investigations of large x-ray optics for free electron lasers
%U https://doi.org/10.1117/12.559619
 
%X