%0 journal article
%@ 0026-3672
%A Weiss, C.,Knoth, J.,Schwenke, H.,Geisler, H.,Lerche, J.,Schulz, R.,Ullrich, H.-J.

%D 2000
%J Mikrochimica Acta
%N 1-4
%P 65-68 

%T Potential of Total Reflection and Grazing Incidence XRF for Contamination and Process Control in Semiconductor Fabrication
%U 
1-4 
%X