@misc{yue_unveiling_nanoscale_2024, author={Yue, X., Chen, D., Krishnan, A., Lazar, I., Niu, Y., Golias, E., Wiemann, C., Gloskovskii, A., Schluetere, C., Jeromin, A., Keller, T.F., Tong, H., Ejnermark, S., Pan, J.}, title={Unveiling nano-scale chemical inhomogeneity in surface oxide films formed on V- and N-containing martensite stainless steel by synchrotron X-ray photoelectron emission spectroscopy/microscopy and microscopic X-ray absorption spectroscopy}, year={2024}, howpublished = {journal article}, doi = {https://doi.org/10.1016/j.jmst.2024.04.006}, abstract = {Nano-scale chemical inhomogeneity in surface oxide films formed on a V- and N-containing martensite stainless steel and tempering heating induced changes are investigated by a combination of synchrotron- based hard X-ray Photoelectron emission spectroscopy (HAXPES) and microscopy (HAXPEEM) as well as microscopic X-ray absorption spectroscopy (μ-XAS) techniques. The results reveal the inhomogeneity in the oxide films on the micron-sized Cr2N- and VN-type particles, while the inhomogeneity on the martensite matrix phase exists due to localised formation of nano-sized tempering nitride particles at 600 °C. The oxide film formed on Cr2N-type particles is rich in Cr2O3 compared with that on the martensite matrix and VN-type particles. With the increase of tempering temperature, Cr2O3 formation is faster for the oxidation of Cr in the martensite matrix than the oxidation of Cr nitride-rich particles.}, note = {Online available at: \url{https://doi.org/10.1016/j.jmst.2024.04.006} (DOI). Yue, X.; Chen, D.; Krishnan, A.; Lazar, I.; Niu, Y.; Golias, E.; Wiemann, C.; Gloskovskii, A.; Schluetere, C.; Jeromin, A.; Keller, T.; Tong, H.; Ejnermark, S.; Pan, J.: Unveiling nano-scale chemical inhomogeneity in surface oxide films formed on V- and N-containing martensite stainless steel by synchrotron X-ray photoelectron emission spectroscopy/microscopy and microscopic X-ray absorption spectroscopy. Journal of Materials Science & Technology. 2024. vol. 205, 191-203. DOI: 10.1016/j.jmst.2024.04.006}}