@misc{martins_structural_evolution_2010, 
author={Martins, R.M.S.,Schell, N.,Borany, J.V.,Mahesh, K.K.,Silva, R.J.C.,Braz Fernandes, F.M.},
title={Structural evolution of magnetron sputtered shape memory alloy Ni–Ti films},
year={2010},
howpublished = {journal article},
doi = {https://doi.org/10.1016/j.vacuum.2009.12.012},
abstract = {Near equiatomic and Ti-rich Ni–Ti polycrystalline films have been deposited by magnetron co-sputtering using a chamber installed at a synchrotron radiation beamline. The in situ X-ray diffraction studies enabled the identification of different steps of the structural evolution during film processing.,The depositions on a 140 nm amorphous SiO2 buffer layer heated at 520 °C (without applying bias voltage, Vb, to the substrate) led to a preferential growth of <100> oriented grains of the Ni–Ti B2 phase from the beginning of film growth until the end of the deposition. Films exhibiting a preferential growth of <110> oriented grains of the Ni–Ti B2 phase from the beginning of the deposition were obtained (without and with a Vb of −45 V) by using a TiN coating with a topmost layer formed by <111> oriented grains. Those trends have been observed for the growth of near equiatomic (≈50.0 at.% Ti–Ni) and Ti-rich (≈50.8 at.% Ti–Ni) Ni–Ti films.,Additionally, an ion gun had been commissioned, which allows ion bombardment during sputter deposition or post-deposition ion irradiation. In this first series of experiments, a Ni–Ti film was irradiated with He ions after deposition (without exposing the film to the atmosphere, i.e., avoiding surface oxide formation), thus modifying deliberately the microstructure of the film locally.},
note = {Online available at: \url{https://doi.org/10.1016/j.vacuum.2009.12.012} (DOI). Martins, R.; Schell, N.; Borany, J.; Mahesh, K.; Silva, R.; Braz Fernandes, F.: Structural evolution of magnetron sputtered shape memory alloy Ni–Ti films. Vacuum. 2010. vol. 84, no. 7, 913-919. DOI: 10.1016/j.vacuum.2009.12.012}}