@misc{martins_characterization_of_2008, 
author={Martins, R.M.S.,Muecklich, A.,Schell, N.,Silva, R.J.C.,Mahesh, K.K.,Braz Fernandes, F.M.},
title={Characterization of Sputtered Shape Memory Alloy Ni-Ti Films by Cross-sectional TEM and SEM},
year={2008},
howpublished = {journal article},
doi = {https://doi.org/10.1017/S1431927608089460},
abstract = {Ni-Ti Shape Memory Alloys (SMAs) have been attracting attention as smart materials because they can work as sensors and actuators at the same time. Miniaturization of mechanical devices is evolving toward sub-micron dimensions raising important questions in the properties of Ni-Ti films. In thin films it is essential to investigate the microstructure to understand the origin of the thickness limit. The design of functionally graded films has also been considered but for their successful development it is important to characterize the variations in crystalline structure.},
note = {Online available at: \url{https://doi.org/10.1017/S1431927608089460} (DOI). Martins, R.; Muecklich, A.; Schell, N.; Silva, R.; Mahesh, K.; Braz Fernandes, F.: Characterization of Sputtered Shape Memory Alloy Ni-Ti Films by Cross-sectional TEM and SEM. Microscopy and Microanalysis. 2008. vol. 14, no. S 3, 85-86. DOI: 10.1017/S1431927608089460}}