@misc{schwenke_measurement_of_1997, 
author={Schwenke, H.,Knoth, J.,Fabry, L.,Pahlke, S.,Scholz, R.,Frey, L.},
title={Measurement of shallow arsenic impurity profiles in semiconductor silicon using time-of-flight secondary ion mass spectrometry and total reflection X-ray fluorescence spectrometry},
year={1997},
howpublished = {journal article},
note = {Online available at: \url{} (DOI). Schwenke, H.; Knoth, J.; Fabry, L.; Pahlke, S.; Scholz, R.; Frey, L.: Measurement of shallow arsenic impurity profiles in semiconductor silicon using time-of-flight secondary ion mass spectrometry and total reflection X-ray fluorescence spectrometry. Journal of the Electrochemical Society. 1997. vol. 144, no. 11, 3979-3983.}}