%0 journal article
%@ 0910-6340
%A Hellin, D., Delabie, A., Puurunen, R., Beaven, P., Conard, T., Brijs, B., de Gendt, S., Vinckier, C.

%D 2005
%J Analytical Sciences
%N 7
%P 845-850 
%R doi:10.2116/analsci.21.845
%T Grazing incidence - X-ray Fluorescence Spectrometry for the Compositional Analysis of Nanometer-thin High- dielectric HfO2 layers
%U https://doi.org/10.2116/analsci.21.845
7 
%X In this paper, we evaluate the use of grazing incidence – and total reflection – X-ray fluorescence spectrometry (GI-XRF and TXRF) for Cl trace analysis in nanometer-thin HfO2 films deposited using ALD. First, the results from different X-ray analysis approaches for the determination of Hf coverage are compared with the results from Rutherford backscattering spectrometry (RBS). Next, we discuss the selection of an appropriate X-ray excitation source for the analysis of traces within the high- layers. Finally, we combine both in a study on the accuracy of Cl determinations in HfO2 layers.